Edwards EO6 Deposition System

The Edwards EO6 Deposition System is:

  • Diffusion pumped system to 10-6 Torr

  • DC and RF sputtering

  • Thermal evaporation of up to 2 sources sequentially

  • Substrate heating to 400°C

  • Thickness monitoring via quartz crystal microbalance

Denton DV502 Turbo Deposition System

The Denton DV502 Turbo Deposition System is:

  • Turbo pumped system to 10-6 Torr

  • Thermal evaporation of up to 2 sources sequentially

  • Substrate heating to 400°C

  • Thickness monitoring via quartz crystal microbalance

Dynavac CE12-14s Evaporation System

The Dynavac CE12-14s Evaporation System is:

  • Diffusion pumped system to 10-6 Torr

  • DC and RF sputtering of 2 sources simultaneously

  • Reactive sputtering with Oxygen atmosphere

  • Substrate heating to 400°C

Shannon E-beam Evaporation System

The Shannon E-beam Evaporation System is:

  • Diffusion pumped system to 10-6 Torr

  • E-beam evaporation

  • Substrate heating to 400°C

  • Thickness monitoring via quartz crystal microbalance