Kim, S, Fröch, JE, Christian, J, Straw, M, Bishop, J, Totonjian, D, Watanabe, K, Taniguchi, T, Toth, M & Aharonovich, I 2018, 'Photonic crystal cavities from hexagonal boron nitride.', Nature Communications, vol. 9, no. 1, pp. 2623-2623.View/Download from: UTS OPUS or Publisher's site
Development of scalable quantum photonic technologies requires on-chip integration of photonic components. Recently, hexagonal boron nitride (hBN) has emerged as a promising platform, following reports of hyperbolic phonon-polaritons and optically stable, ultra-bright quantum emitters. However, exploitation of hBN in scalable, on-chip nanophotonic circuits and cavity quantum electrodynamics (QED) experiments requires robust techniques for the fabrication of high-quality optical resonators. In this letter, we design and engineer suspended photonic crystal cavities from hBN and demonstrate quality (Q) factors in excess of 2000. Subsequently, we show deterministic, iterative tuning of individual cavities by direct-write EBIE without significant degradation of the Q-factor. The demonstration of tunable cavities made from hBN is an unprecedented advance in nanophotonics based on van der Waals materials. Our results and hBN processing methods open up promising avenues for solid-state systems with applications in integrated quantum photonics, polaritonics and cavity QED experiments.
Bishop, J, Fronzi, M, Elbadawi, C, Nikam, V, Pritchard, J, Fröch, JE, Duong, NMH, Ford, MJ, Aharonovich, I, Lobo, CJ & Toth, M 2018, 'Deterministic Nanopatterning of Diamond Using Electron Beams.', ACS nano, vol. 12, no. 3, pp. 2873-2882.View/Download from: UTS OPUS or Publisher's site
Diamond is an ideal material for a broad range of current and emerging applications in tribology, quantum photonics, high-power electronics, and sensing. However, top-down processing is very challenging due to its extreme chemical and physical properties. Gas-mediated electron beam-induced etching (EBIE) has recently emerged as a minimally invasive, facile means to dry etch and pattern diamond at the nanoscale using oxidizing precursor gases such as O2 and H2O. Here we explain the roles of oxygen and hydrogen in the etch process and show that oxygen gives rise to rapid, isotropic etching, while the addition of hydrogen gives rise to anisotropic etching and the formation of topographic surface patterns. We identify the etch reaction pathways and show that the anisotropy is caused by preferential passivation of specific crystal planes. The anisotropy can be controlled by the partial pressure of hydrogen and by using a remote RF plasma source to radicalize the precursor gas. It can be used to manipulate the geometries of topographic surface patterns as well as nano- and microstructures fabricated by EBIE. Our findings constitute a comprehensive explanation of the anisotropic etch process and advance present understanding of electron-surface interactions.
Elbadawi, C, Queralt, RT, Xu, Z-Q, Bishop, J, Ahmed, T, Kuriakose, S, Walia, S, Toth, M, Aharonovich, I & Lobo, CJ 2018, 'Encapsulation-Free Stabilization of Few-Layer Black Phosphorus.', ACS applied materials & interfaces, vol. 10, no. 29, pp. 24327-24331.View/Download from: UTS OPUS or Publisher's site
Under ambient conditions and in H2O and O2 environments, reactive oxygen species (ROS) cause immediate degradation of the mobility of few-layer black phosphorus (FLBP). Here, we show that FLBP degradation can be prevented by maintaining the temperature in the range 125-300 °C during ROS exposure. FLBP devices maintained at elevated temperature show no deterioration of electrical conductance, in contrast to the immediate degradation of pristine FLBP held at room temperature. Our results constitute the first demonstration of stable FLBP in the presence of ROS without requiring encapsulation or a protective coating. The stabilization method will enable applications based on the surface properties of intrinsic FLBP.
Martin, AA, Bahm, A, Bishop, J, Aharonovich, I & Toth, M 2015, 'Dynamic Pattern Formation in Electron-Beam-Induced Etching', PHYSICAL REVIEW LETTERS, vol. 115, no. 25.View/Download from: UTS OPUS or Publisher's site
Bishop, J, Toth, M, Phillips, M & Lobo, C 2012, 'Effects of oxygen on electron beam induced deposition of SiO2 using physisorbed and chemisorbed tetraethoxysilane', Applied Physics Letters, vol. 101, p. 211605.View/Download from: UTS OPUS or Publisher's site
Electron beam induced deposition (EBID) is limited by low throughput and purity of as-grown material. Co-injection of O2 with the growth precursor is known to increase both the purity and deposition rate of materials such as SiO2 at room temperature. Here, we show that O2 inhibits rather than enhances EBID from tetraethoxysilane (TEOS) precursor at elevated temperatures. This behavior is attributed to surface site competition between chemisorbates at elevated temperature, and TEOS decomposition by atomic oxygen produced through electron dissociation of physisorbed O2 at room temperature.
Bishop, JD, Lobo, C, Martin, AA, Ford, M, Phillips, M & Toth, M 2012, 'Role of activated chemisorption in gas-mediated electron beam induced deposition', Physical Review Letters, vol. 109, p. 146103.View/Download from: UTS OPUS or Publisher's site
Models of adsorbate dissociation by energetic electrons are generalized to account for activated sticking and chemisorption, and used to simulate the rate kinetics of electron beam induced chemical vapor deposition (EBID). The model predicts a novel temperature dependence caused by thermal transitions from physisorbed to chemisorbed states that govern adsorbate coverage and EBID rates at elevated temperatures. We verify these results by experiments that also show how EBID can be used to deposit high purity materials and characterize the rates and energy barriers that govern adsorption.
Biro, D. & Bishop, J. 2017, 'Advances in electron beam curing in wide web flexible package printing', Proceedings of the Technical Association of the Graphic Arts, TAGA, pp. 143-147.
© 2017 Technical Association of the Graphic Arts. All rights reserved. Electron beam curing for wide web flexible package printing continues to evolve. Flexographic ink systems have been optimized to allow wet trapping of ink colors cured with a single electron beam (EB) unit after the last station in a central- impression press configuration. Long runs with stable printing performance are enabled by new press technology that includes temperature controlled print stations. Web offset flexible package printing is also attractive given advances in variable repeat press technology. This includes the development of presses with offset print stations arranged in a central-impression configuration. A comparison of EB flexographic and EB offset printing technology will be presented Both technologies allow for flexible package printing with near zero VOCs and low migration inks that are well suited for food packaging applications.
Lobo, CJ, Martin, AA, Elbadawi, C, Bishop, J, Aharonovich, I & Toth, M 2014, 'Gas-mediated charged particle beam processing of nanostructured materials', Proceedings of SPIE - The International Society for Optical Engineering, The International Society for Optical Engineering Conference, SPIE-INT SOC OPTICAL ENGINEERING, San Francisco, CA.View/Download from: UTS OPUS or Publisher's site
Gas mediated processing under a charged particle (electron or ion) beam enables direct-write, high resolution surface functionalization, chemical dry etching and chemical vapor deposition of a wide range of materials including catalytic metals, optoelectronic grade semiconductors and oxides. Here we highlight three recent developments of particular interest to the optical materials and nanofabrication communities: fabrication of self-supporting, three dimensional, fluorescent diamond nanostructures, electron beam induced deposition (EBID) of high purity materials via activated chemisorption, and post-growth purification of nanocrystalline EBID-grown platinum suitable for catalysis applications. © 2014 SPIE.