Kreuzpaintner, W, Störmer, M, Lott, D, Solina, D & Schreyer, A 2008, 'Epitaxial growth of nickel on Si(100) by dc magnetron sputtering', Journal of Applied Physics, vol. 104, no. 11.View/Download from: Publisher's site
The influence of the substrate temperature on the growth of highly textured Ni(111) and epitaxial Ni(200) with the relationships Ni  Si  and Ni (001) Si (001) on hydrogen terminated Si(100) wafer substrates by means of direct current magnetron sputtering is reported. In order to minimize crystal defect formation and to achieve a high quality epitaxial growth of Ni on Si, a two step deposition process was developed whereby different deposition conditions were used for an initial nickel seed layer and the remaining nickel film. The in-plane and out-of-plane structural properties of the films were investigated using x-ray scattering techniques, whereas magneto-optical Kerr effect and neutron reflectometry were used to confirm the magnetic nature of the epitaxially deposited nickel films. © 2008 American Institute of Physics.
Toperverg, BP, Kampmann, R, Lauter-Pasyuk, VV, Lauter, HJ, Tietze, U, Solina, D & Schreyer, A 2007, 'Larmor encoding and Fourier reconstruction for wavelength dispersive reflectometry', Physica B: Condensed Matter, vol. 397, no. 1-2, pp. 141-143.View/Download from: Publisher's site
As is well known the Larmor precession of the neutron polarization passing through a range of homogeneous magnetic field can efficiently be used for perfectly harmonic modulation of incoming (or scattered) intensity as a function of neutron wavelength. We show that the Fourier analysis of a few reflection curves obtained at a proper set of Larmor frequencies allows to numerically reconstruct the genuine reflectivity curve in great details even in the case it has been measured with a rather purely monochromatized beam. It is argued that the method can be used to substantially improve wave length resolution with moderate increase in measuring time. Further applications of the method, e.g. to small angle scattering at grazing incidence (GISANS), are briefly discussed. © 2007.
Solina, D, Lott, D, Tietze, U, Frank, O, Leiner, V & Schreyer, A 2006, 'The new neutron reflectometer NERO', Physica B: Condensed Matter, vol. 385-386, pp. 1167-1169.View/Download from: Publisher's site
The year 2005 saw the opening of the new NEutron ReflectOmeter (NERO) at the GKSS research centre in Geesthacht, Germany for the investigation of magnetic and non-magnetic systems as well as soft matter nano-structures. NERO operates with a monochromatic beam of neutrons of wavelength 0.433 nm with a resolution better than 2%. An angular range of -20°<2θ<100° allows for both reflectometry and high-angle diffraction measurements to be made. NERO has both a position-sensitive detector and a pencil detector installed for flexibility when making specular and diffuse measurements. NERO has been designed to accommodate heavy-sample environments such as cryo-furnaces and various kinds of magnets. Polarization analysis is available for the investigation of magnetic nano-structures. A supermirror stack with a wide angular-acceptance range will be available in 2006 for time-efficient measurements of magnetic diffuse reflectivity. Further information and proposal forms can be obtained online at http//:genf.gkss.de. © 2006 Elsevier B.V. All rights reserved.
Solina, DM, Cheary, RW, Kalceff, W & McCredie, G 2005, 'X-ray reflectivity study of radio frequency sputtered silicon oxide on silicon', Thin Solid Films, vol. 489, no. 1-2, pp. 37-41.View/Download from: UTS OPUS or Publisher's site
An X-ray reflectivity study carried out on 45-450 angstrom films of radio frequency sputtered silicon oxide on silicon, with particular attention given to the interface between film and substrate. In order to model refectivity data it was necessary to in
Swift, PD, Solina, DM, Cheary, RW & McCredie, G 2003, 'Investigation of the interfacial structure of ultra-thin platinum film deposited by cathodic-arc', Thin Solid Films, vol. 440, no. 1-2, pp. 117-122.View/Download from: UTS OPUS or Publisher's site
Ultra-thin films are of interest in the production of X-ray mirrors that use a multilayer structure. The most commonly used deposition techniques are dc magnetron sputtering and electron beam evaporation; this paper presents results of cathodicarc deposition. Ultra thin films of platinum with nominal thicknesses in the range 1565 Å were deposited on silicon substrates and the film structure investigated using X-ray reflectivity and X-ray photoelectron spectroscopy. It has been found that the structure of the deposited films consists of three layersthe platinum film, a silicon oxide layer and a platinum silicide layer. In contrast to dc magnetron and electron beam deposited films, the silicide layer of cathodicarc deposited films have a higher density and greater thickness, which is attributed to the higher energy process of this deposition technique. These attributes of the cathodicarc deposited films suggest that the deposition technique is not suitable for production of mirrors of materials that react with each other, but for materials that do not the deposition technique is potentially more favourable than that of e-beam and magnetron sputtering.
Solina, DM, Cheary, RW, Swift, PD & McCredie, G 2003, 'The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors', Thin Solid Films, vol. 423, no. 1, pp. 1-12.View/Download from: UTS OPUS or Publisher's site
An investigation has been carried out to determine the conditions required for the fabrication of stable SiO2Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO2. As a preliminary investigation, single layers of Pt on SiO2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the PtSiO2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO2Pt multilayers fabricated with a period d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When d<65 Å the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO2 layers are incompletely oxidised and have a composition SiOx (x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiOx to SiO2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with d<65 Å remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtOx (x<1). SiO2/PtOx multilayers have been fabricated with periods down to 13 Å, but the intensity of the first order peak drops off dramatically once the thickness of the PtOx layer is less that 1012 Å.
Solina, DM, Cheary, RW, Swift, PD, Dligatch, S, McCredie, G, Gong, B & Lynch, PA 2000, 'Investigation of the Interfacial Structure of Ultra-Thin Platinum Films Using X-Ray Reflectivity ad X-ray Photoelectron Spectroscopy', Thin Solid Films, vol. 372, no. 0, pp. 94-103.
Ultra-thin films of platinum deposited on highly polished 100 silicon have been investigated using X-ray reflectivityXRR.and X-ray photoelectron spectroscopyXPS.as part of a study on the interface structure of multilayers used for X-ray mirrors. In this paper results are presented for films deposited by electron beam evaporation and by DC-magnetron sputtering. The reflectivity was fitted by assuming an intermediate platinum silicide layer exists between the platinum and the silicon. XPS data clearly confirmed the existence of such a platinum silicide layer. According to the XRR data this layer was estimated to be approximately 10 A°thick for e-beam samples and approximately 30 A°thick for magnetron samples. For e-beam films the fitted density for the platinum silicide layer was found to decrease from 16.4 g?cmy3 for a nominal 80 A° film down to 2.65 g?cmy3 for a nominal 20 A° film. For magnetron sputtered films the fitted density was always within the range of 6.1]6.8 g?cmy3. The fitted density of the platinum layer from the e-beam results was always within 5% of the density of bulk platinum whereas for the magnetron sputtered films the density decreased uniformly with decreasing film thickness for films with a nominal thickness less than 30 A°. The XPS data show that the magnetron deposited platinum penetrates through the native oxide layer and into the silicon substrate to a far greater degree than the e-beam deposited platinum.
Coupland, M, Solina, D & Cave, G 2017, 'Mastery Learning: Improving the Model', 40 years on: We are still learning! Proceedings of the 40th Annual Conference of the Mathematics Education Research Group of Australasia, 40 years on: We are still learning! Proceedings of the 40th Annual Conference of the Mathematics Education Research Group of Australasia, MERGA : Mathematics Education Research Group of Australasia, Melbourne, pp. 189-196.View/Download from: UTS OPUS
In this paper, we report on developments in the Mastery Learning (ML) curriculum and assessment model that has been successfully implemented in a metropolitan university for teaching first-year mathematics. Initial responses to ML were positive; however, we ask
whether the nature of the ML tests encourages a focus on shallow learning of procedures, and whether the structure of the assessment regime provides sufficient motivation for learning more complex problem solving. We analysed assessment data, as well as student reports and survey responses in an attempt to answer these questions.
Solina, DM, Liedke, MO, Tietze, U, Fassbender, J & Schreyer, A 2004, 'Reflectivity characterisation of ion irradiated exchange bias FeMn-FeNi films', JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 5th International Symposium on Metallic Multilayers, ELSEVIER SCIENCE BV, Natl Inst Stand & Technol, Boulder, CO, pp. 225-228.View/Download from: Publisher's site
Lott, D, Solina, D, Almokhtar, M, Mibu, K, Schmidt, W & Schreyer, A 2004, 'Modifications of the spin density wave of Cr in Fe/Cr multilayers by insertion of Sn studied by neutron diffraction', Physica B: Condensed Matter.View/Download from: Publisher's site
Recently, the magnetic properties of chromium in Fe/Cr multilayers were studied with Mössbauer spectroscopy by inserting a tin monolayer in the chromium. Complementary neutron-diffraction studies on Fe/Cr(t) and Fe/Cr(t/2)/ Sn(2 Å)/Cr(t/2) multilayers with t = 80 and 160 Å are presented here. The Fe/Cr multilayers behave as previously observed, however the samples with tin deviate from these trends. These deviations are more prominent in the Fe/Cr/ Sn/Cr multilayer with t= 80 Å. Instead of an incommensurate to commensurate spin-density-wave (SDW) transition with increasing temperature (T) as seen without tin, a dominant commensurate component is observed at low T transforming to an incommensurate phase at higher T. The general SDW behaviour of chromium in Fe/Cr multilayers seems to be changed significantly by the insertion of Sn, allowing the tailoring of magnetic properties of Fe/Cr systems in a new way. © 2004 Elsevier B.V. All rights reserved.